Method for fabricating NAND type dual bit nitride read only memory

ABSTRACT

A NAND type dual bit nitride read only memory and a method for fabricating thereof are provided. Firstly, a plurality of isolation layers, which are spaced and parallel to each other are formed in the substrate. Next, a plurality of word lines and a plurality of oxide-nitride-oxide (ONO) stack structures are formed on the substrate. The word lines are spaced and parallel to each other, and also the word lines are perpendicular to the isolation layers. Each of the ONO stack structure is located between the corresponding word line and the substrate. And then a plurality of discontinuous bit lines, which are located between the word lines and between the isolation layers are formed on the substrate. The structure of the present invention of the NAND type dual bit nitride read only memory is similar to that of a complementary metal-oxide semiconductor (CMOS), and their fabrication processes are fully compatible.

This application claims the benefit of Taiwan application Serial No.92119086, filed Jul. 11, 2003.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The invention relates in general to a memory and a method forfabricating the same, and more particularly to a NAND type dual bitnitride read only memory (also called N-bit) and a method forfabricating the same, that a process sequence is fully compatible with acomplementary metal-oxide semiconductor (CMOS) process.

2. Description of the Related Art

N-bits (nitride read only memory) can be classified as NOR type N-bitand NAND type N-bit. NOR type N-bit features in capacities of storinginstructions, prompt execution, rapid reading, large memory cell areaand small storage capacity. NOR type N-bit is mainly applied in mobilephones, optical disk drives, hard disks and printers. NAND type N-bitfeatures in data storage but not instruction storage. Also, the NANDtype N-bit has small area addition, the barrier diffusion oxide 22 areformed above the buried bit lines 20 to isolate the word lines 24.

The memory cells 32 are formed by the word lines 24, the buried bitlines 20, and the ONO stack structures 17. The memory cells 32 form as acell array as shown in FIG. 1A. Each of the memory cells 32 includes thefirst bit storage nodes 34 and the second bit storage nodes 36. Thefirst bit storage nodes 34 and the second bit storage nodes 36 of everymemory cell 32 are spaced at intervals along an extension direction ofthe word lines 24, so that the area of every memory cell 32 can belarger.

Referring to FIG. 2A to FIG. 2E, a cross-sectional view of procedures ofa fabricating method for a NOR type dual bit N-bit of FIG. 1B is shown.Firstly, the silicon substrate 10 is provided and an ONO layer 16 isformed on the silicon substrate 10. The ONO layer 16 includes the bottomoxide layer 11, the silicon nitride (SiN) layer 13, and the top oxidelayer 15 from the below to the top in order. Subsequently, a patternedphotoresist layer 18 is formed on the ONO layer 16. And also the spacedand parallel buried bit lines 20 are formed by utilizing an ionimplantation process. The buried bit lines 20 are formed in the siliconsubstrate 10, which is not covered by the patterned photoresist layer 18as shown in FIG. 2B. Ion implantation is applied to form the buried bitlines 20, which includes the steps of: consequently influenced.

SUMMARY OF THE INVENTION

It is therefore an object to provide a NAND type dual bit nitride readonly memory (N-bit) and a method for fabricating the same, so as toprevent the diffusion phenomenon caused by an impact of high temperatureon the dopant ion of the buried bit lines. Further, a structure of thepresent invention of the NAND type dual bit nitride read only memory(N-bit) is similar to a structure of a complementary metal-oxidesemiconductor (CMOS), and also a process sequence is fully compatible.Therefore, a difficulty in research and development of the fabricationof the N-bit can be reduced, and a design for a cell scaling can havehigher potential.

According to an object of the present invention, a NAND type dual bitdual bit nitride read only memory (N-bit) is provided, including atleast a substrate, a plurality of isolation layers, a plurality of wordlines, a plurality of oxide-nitride-oxide (ONO) stack structures, and aplurality of discontinuous bit lines. The isolation layers are spacedand parallel to each other in the substrate. The word lines are spacedand parallel to each other on the substrate. The word lines areperpendicular to the isolation layers. Each of the oxide-nitride-oxide(ONO) stack structures is formed between the corresponding word line andthe substrate. The discontinuous bit lines are formed in the substrate,and the discontinuous bit lines are located between the word lines andbetween the isolation layers.

According to another object of the present invention, a method forfabricating a NAND type dual bit nitride read only memory (N-bit) isprovided. Firstly, a substrate is provided. And then a plurality ofisolation layers, which are spaced and parallel to each other in thesubstrate are formed. Next, a plurality of word lines and a plurality ofoxide-nitride-oxide (ONO) stack structures on the substrate are formed.The word lines are spaced and parallel to each other, and also the wordlines are perpendicular to the isolation layers. Each of the ONO stackstructures is located between the corresponding word lines and thesubstrate. And then a plurality of discontinuous bit lines are formed inthe substrate, wherein the discontinuous bit lines are located betweenthe word lines and between the isolation layers.

According to another object of the present invention, a method forfabricating a NAND type dual bit nitride read only memory (N-bit) isprovided. Firstly, a substrate is provided and several spaced andparallel isolation layers are formed in the substrate. And then an ONOlayer is formed on the substrate. Next, a polysilicon layer is formed onthe ONO layer. Sequentially, a patterned photoresist layer is formed onthe polysilicon layer. And then an exposed part of the polysilicon layerand the ONO layer thereunder are removed, so as to form the word linesand the ONO stack structures on the substrate. The word lines are spacedand parallel to each other, and also the word lines are perpendicular tothe isolation layers. Each of the ONO stack structures is located underthe corresponding word lines. Sequentially, a plurality of discontinuousbit lines are formed in the substrate by utilizing an ion implantationprocess, wherein the discontinuous bit lines are located between theword lines and between the isolation layers. And then the patternedphotoresist layer is removed.

Other objects, features, and advantages of the invention will becomeapparent from the following detailed description of the preferred butnon-limiting embodiments. The following description is made withreference to the accompanying drawings.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1A (prior art) is a vertical view of a part of a conventional NORtype dual bit nitride read only memory.

FIG. 1B (prior art) is a cross-sectional view along hatches of 1B to 1B′of FIG. 1A of a NOR type dual bit nitride read only memory.

FIG. 2A to 2E illustrate a cross-sectional view of procedures of afabricating method for a NOR type dual bit nitride read only memory ofFIG. 1B.

FIG. 3A is a partial vertical view of the present invention of apreferred embodiment of a NAND type dual bit nitride read only memory(N-bit).

FIG. 3B is a cross-sectional view along hatches of 3B to 3B′ of FIG. 3Aof a NAND type dual bit nitride read only memory.

FIG. 3C is a cross-sectional view along hatches of 3C to 3C′ of FIG. 3Aof a NAND type dual bit nitride read only memory.

FIG. 4A to FIG. 4D are a cross-sectional view of procedures of afabricating method for a NAND type dual bit nitride read only memory ofFIG. 3B.

FIG. 5A to FIG. 5D are a cross-sectional view of procedures of afabricating method for a NAND type dual bit nitride read only memory ofFIG. 3C.

FIG. 6A to FIG. 6C are a cross-sectional view of procedures of afabricating method of forming the spaced and parallel isolation layersby utilizing a shallow trench isolation (STI) process.

FIG. 7A to FIG. 7B are a cross-sectional view of procedures of afabricating method of forming the spaced and parallel isolation layersby utilizing a local oxidation of silicon (LOCOS) process.

FIG. 8 is a diagram showing a circuit architecture of a memory cell ofFIG. 3B.

DETAILED DESCRIPTION OF THE INVENTION

The NAND type dual bit nitride read only memory (N-bit) according to thepreferred embodiment of the invention is described with reference toFIG. 3A to FIG. 3C. FIG. 3A is a partial vertical view of the presentinvention of a preferred embodiment of a NAND type dual bit nitride readonly memory (N-bit); FIG. 3B is a cross-sectional view along hatches of3B to 3B′ of FIG. 3A of a NAND type dual bit N-bit; and FIG. 3C is across-sectional view along hatches of 3C to 3C′ of FIG. 3A of a NANDtype dual bit N-bit. A NAND type dual bit N-bit 130 includes at least asubstrate 110, a plurality of isolation layers 150, a plurality of wordlines 124, a plurality of oxide-nitride-oxide (ONO) stack structures117, a plurality of discontinuous bit lines 120. The memory cells 132are large dotted-line ranges of FIG. 3A and FIG. 3B. A plurality offirst bit storage nodes 134, and a plurality of second bit storage cells136, which are small dotted-line ranges of FIG. 3A and FIG. 3B.

In FIG. 3A, the isolation layers 150 are spaced and parallel to eachother in the substrate 110, and also the word lines 124 are spaced andparallel to each other on the substrate 110. The word lines 124 areperpendicular to the isolation layers 150. In FIG. 3B, each of the ONOstack structures 117 is formed under the corresponding word line 124.The ONO stack structures 117 include a bottom oxide layer 111 formed onthe substrate 110, a nitride layer 113 formed on the bottom oxide layer111, and a top oxide layer 115 formed on the nitride layer 113.

The invention features that the discontinuous bit lines 120 are formedin the substrate, and the discontinuous bit lines are located betweenthe word lines 124 and between the isolation layers 150. The word lines124, the discontinuous bit lines 120 and the ONO stack structures 117form the memory cells 132, and the memory cells 132 are arranged as acell array as shown in FIG. 3A. Every memory cell 132 includes a firststorage node 134 and a second storage node 136. The first storage node134 and the second storage node 136 of every memory cell 132 arearranged at interval along the extension direction of the discontinuousbit lines 120 and also located at two sides of every word line 124, sothat the size of every memory cell 132 can be reduced.

With reference to FIG. 4A to FIG. 5D, FIG. 4A to FIG. 4D are across-sectional view showing the process of fabricating a NAND type dualbit N-bit of FIG. 3B, FIG. 5A to FIG. 5D are a cross-sectional viewshowing the process of fabricating a NAND type dual bit N-bit of FIG.3C, and FIG. 5A to 5D corresponds to FIG. 4A to FIG. 4D, respectively.Firstly, in FIG. 4A and FIG. 5A, a substrate 110 is provided. Thesubstrate 110 can be silicon substrate for example, and also severalspaced and parallel isolation layers 150 are formed in the substrate110. FIG. 4A is a cross-sectional view along a direction of the wordline, and it does not show the structure of the insulation layers 150.

Accordingly, an ONO layer 116, a polysilicon layer 123, and a patternedphotoresist layer 118 are formed in order on the substrate 110 as shownin FIG. 4B and FIG. 5B. FIG. 5B is a cross-sectional view along adirection of the word line, and it does not show a structure of thepatterned photoresist layer 118. The ONO layer 116 includes a bottomoxide layer 111, a nitride layer 113, and a top oxide layer 115. Thenitride layer 113 can be made of silicon nitride, which is formed on thebottom oxide layer 111. And also the top oxide layer 115 is formed onthe nitride layer 113. In addition, the polysilicon layer 123 is formedon the ONO layer 116, and the patterned photoresist layer 118 is formedon the polysilicon layer 123.

Sequentially, an exposed part of the polysilicon layer 123 and the ONOlayer 116 thereunder is removed, so as to form several word lines 124and several ONO stack structures 117 on the substrate 110. The wordlines 124 are spaced and parallel to each other, and also the word lines124 are perpendicular to the isolation layers 150. Each of the ONO stackstructures 117 is located between the corresponding word lines 124 andthe substrate 110, as shown in FIGS. 4C and 5C. However, FIG. 5C doesnot show the word lines 124 and the ONO stack structures 117.

Next, several discontinuous bit lines 120 are formed in the substrate110, and the discontinuous bit lines 120 are located between the wordlines 124 and between the isolation layers 150, and also the patternedphotoresist 118 is removed as shown in FIGS. 4D and 5D. Thediscontinuous bit lines 120 are formed by utilizing an ion implantationprocess between the word lines 124 and between the isolation layers 150of the substrate 110.

Particularly, the invention can use a shallow trench isolation (STI)process or a local oxidation of silicon (LOCOS) process to form theisolation layers 150 in the substrate 110. A brief description is asfollows.

A step of forming the spaced and parallel isolation layers 150 byutilizing a shallow trench isolation (STI) process includes: firstly, apatterned hard mask 155 is formed on the substrate 110, as shown in FIG.6A. And then an exposed part of the substrate 110 is removed to form aplurality of spaced and parallel shallow trenches 160 in the substrate110, as shown in FIG. 6B. Next, an insulating material is filled intothe shallow trenches 160 to form the spaced and parallel isolationlayers 150 in the substrate 110, as shown in FIG. 6C. The insulation ismade of silicon dioxide (SiO₂), for example. Subsequently, the patternedhard mask 155 is removed, as shown in FIG. 5A.

In addition, a step of forming the spaced and parallel isolation layers150 by utilizing a local oxidation of silicon (LOCOS) process includes:firstly, a patterned hard mask 165 is formed on the substrate 110, asshown in FIG. 7A. The patterned hard mask 165 is made of silicon nitride(Si₃N₄). And then an exposed part of the substrate 110 is oxidized toform the spaced and parallel isolation layers 150 in the substrate 110,as shown in FIG. 7B. Next, the patterned hard mask 165 is removed, asshown in FIG. 5A.

Referring to FIG. 8, it is a diagram showing a circuit architecture of acell of FIG. 3B. In FIG. 8, Vg, Vb, Vs, Vd represent applied voltage ofthe word lines 124 on the memory cell 132, the substrate 110 below thememory cell 132, the word lines 124 left to the memory cell 132, and theword lines 124 right to the memory cell 132, respectively. L representsthe first storage node 134, and R represents the second storage node136. The operation of the memory cell 132 is illustrated by examples asfollows.

-   First, the memory cell 132 is initialized when Vg is set as −5V to    −20V and Vd=Vs=Vb=0V;-   Second, R is read when Vs=1˜3V, Vg=1˜3V, and Vd=Vb=0V;-   Third, L is read when Vd=1˜3V, Vg=1˜3V, and Vs=Vb=0V;-   Fourth, R is programmed when Vg is set as −2V to −10V, Vd=3˜10V, and    Vs=Vb=0V;-   Fifth, L is programmed when Vg is set as −2V to −10V, Vs=3˜10V, and    Vd=Vb=0V; and-   Sixth, the memory cell 132 is erased when Vg is set as −5V to −20V    and Vd=Vs=Vb=0V.

Therefore, the NAND type dual bit nitride read only memory (N-bit) andmethod for fabricating thereof include the advantages of:

First, the discontinuous bit lines are formed after the thermal processfor forming the polysilicon layer and the ONO layer so that thediffusion of the dopant ion in the buried bit lines can be prevented.Therefore, the electricity quality of the NAND type N-bit can beimproved.

Second, the invention includes less process steps than the conventionalsince the formation of the barrier diffusion oxide is omitted. Thus theproduction cost is reduced.

Third, the structure of the NAND type dual bit nitride read only memory(N-bit) of the present invention is similar to that of the complementarymetal-oxide semiconductor (CMOS), and also the processes of the two arefully compatible to each other. Thus, the difficulty of fabricatingN-bit can be reduced and the cell scaling becomes more competitive.

While the invention has been described by way of example and in terms ofa preferred embodiment, it is to be understood that the invention is notlimited thereto. On the contrary, it is intended to cover variousmodifications and similar arrangements and procedures, and the scope ofthe appended claims therefore should be accorded the broadestinterpretation so as to encompass all such modifications and similararrangements and procedures.

1-10. (canceled)
 11. A method for fabricating a dual bit nitride readonly memory comprising: providing a substrate; forming a plurality ofisolation layers, which are spaced and parallel to each other in thesubstrate; forming a plurality of word lines and a plurality ofoxide-nitride-oxide (ONO) stack structures on the substrate, wherein theword lines are spaced and parallel to each other, the word lines areperpendicular to the isolation layers, and each of the ONO stackstructure is located under the corresponding word line; and forming aplurality of discontinuous bit lines in the substrate, wherein thediscontinuous bit lines are located between the word lines and betweenthe isolation layers.
 12. The method according to claim 11, wherein thestep of forming the isolation layers in the substrate further comprisesforming the isolation layers in the substrate by utilizing a shallowtrench isolation (STI) process.
 13. The method according to claim 12,wherein the step of forming the isolation layers in the substrate byutilizing the shallow trench isolation (STI) process further comprises:forming a patterned mask on the substrate so that a part of thesubstrate is exposed; removing the exposed part of the substrate to forma plurality of spaced and parallel shallow trenches in the substrate;filling an insulating material into the shallow trenches to form thespaced and parallel isolation layers in the substrate; and removing thepatterned mask.
 14. The method according to claim 13, wherein theinsulating material is SiO₂.
 15. The method according to claim 11,wherein the step of forming the isolation layers in the substratefurther comprises forming the isolation layers in the substrate byutilizing a local oxidation of silicon (LOCOS) process.
 16. The methodaccording to claim 15, wherein the step of forming the isolation layersin the substrate by utilizing the local oxidation of silicon (LOCOS)process further comprises: forming a patterned mask on the substrate sothat a part of the substrate is exposed; oxidizing the exposed part ofthe substrate to form the spaced and parallel isolation layers in thesubstrate, and removing the patterned mask.
 17. The method according toclaim 16, wherein the patterned hard mask is made of silicon nitride(Si₃N₄).
 18. The method according to claim 11, wherein the step offorming the word lines and the oxide-nitride-oxide (ONO) stackstructures on the substrate further comprises: forming an ONO layer onthe substrate; forming a polysilicon layer on the ONO layer; forming apatterned layer on the polysilicon layer so that a part of thepolysilicon layer is exposed; removing the exposed part of thepolysilicon layer and the ONO layer thereunder to form the word linesand the ONO stack structures on the substrate.
 19. The method accordingto claim 18, wherein the step of forming the ONO layer on the substratefurther comprises: forming a bottom oxide layer on the substrate;forming a nitride layer on the bottom oxide layer; and forming a topoxide layer on the nitride layer.
 20. The method according to claim 19,wherein the nitride layer is made of silicon nitride.
 21. The methodaccording to claim 18, wherein the step of forming the discontinuous bitlines in the substrate further comprises forming the discontinuous bitlines by utilizing an ion implantation process, wherein thediscontinuous bit lines are located between the word lines and betweenthe isolation layers in the substrate.
 22. The method according to claim21, after the step of forming the discontinuous bit lines in thesubstrate by utilizing the ion implantation process, further comprisingremoving the patterned layer.
 23. A method for fabricating a dual bitnitride read only memory comprising: providing a substrate; forming aplurality of isolation layers, which are spaced and parallel to eachother in the substrate; forming an oxide-nitride-oxide (ONO) layer onthe substrate; forming a polysilicon layer on the ONO layer; forming apatterned layer on the polysilicon layer so that a part of thepolysilicon layer is exposed; removing the exposed part of thepolysilicon layer and the ONO layer thereunder to form a plurality ofword lines and a plurality of ONO stack structures on the substrate,wherein the word lines are spaced and parallel to each other on thesubstrate, the word lines are perpendicular to the isolation layers, andeach of the ONO stack structures is located under the corresponding wordline; forming a plurality of discontinuous bit lines in the substrate byutilizing an ion implantation process, wherein the discontinuous bitlines are located between the word lines and between the isolationlayers; and removing the patterned layer.
 24. The method according toclaim 23, wherein the step of forming the isolation layers in thesubstrate further comprises forming the spaced and parallel isolationlayers in the substrate by utilizing a shallow trench isolation (STI)process.
 25. The method according to claim 24, wherein the step offorming the spaced and parallel isolation layers in the substrate byutilizing the shallow trench isolation (STI) process further comprises:forming a patterned mask on the substrate so that a part of thesubstrate is exposed; removing the exposed part of the substrate to forma plurality of spaced and parallel shallow trenches in the substrate;filling an insulating material into the shallow trenches to form thespaced and parallel isolation layers in the substrate; and removing thepatterned mask.
 26. The method according to claim 25, wherein theinsulating material is silicon dioxide (SiO₂).
 27. The method accordingto claim 23, wherein the step of forming the isolation layers in thesubstrate further comprises forming the isolation layers in thesubstrate by utilizing a local oxidation of silicon (LOCOS) process. 28.The method according to claim 27, wherein the step of forming theisolation layers in the substrate by utilizing the process of localoxidation of silicon (LOCOS) further comprises: forming a patterned maskon the substrate so that a part of the substrate is exposed; oxidizingthe exposed part of the substrate to form the spaced and parallelisolation layers in the substrate; and removing the patterned mask. 29.The method according to claim 23, wherein the step of forming the ONOlayer on the substrate further comprises: forming a bottom oxide layeron the substrate; forming a nitride layer on the bottom oxide layer; andforming a top oxide layer on the nitride layer.